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From wafer-scale metrology to AI-assisted analysis, each capability is built on instrumentation-grade rigor, and delivered with data you can defend in a review or a fab meeting.
Optical metrology for thin films, layered structures, and their electronic and vibrational properties. We determine thickness, optical constants, bandgap, and vibrational signatures across your sample, non-destructively, with uncertainty stated rather than implied.
Structural, compositional, and defect-level analysis using X-ray and direct surface techniques, run standalone or alongside ellipsometry on the same sample so the datasets corroborate each other.
Measurement is only useful if it answers the right question. We work with your team on the framing as well as the data: which technique actually resolves the ambiguity, how many samples you need, and what the result will and will not tell you.
Characterization campaigns generate more data than anyone reads. We build the tooling that turns spectra, maps, and image stacks into decisions, and hand it over as code you own rather than a black box.
Not sure which technique fits? Describe the sample and we will recommend an approach.
A starting point, not a rulebook. Most real questions are answered best by combining two of these.
| Technique | Answers | Best suited to |
|---|---|---|
| Spectroscopic Ellipsometry | Thickness, refractive index, extinction coefficient | Thin films and multilayer stacks on reflective substrates |
| Imaging Ellipsometry | Spatial variation of the above | Patterned, graded, or visibly non-uniform samples |
| Reflectometry | Thickness and interface quality, single measurement | Fast process checks on production-relevant samples |
| Photoluminescence (PL) | Bandgap, defect states, carrier lifetime | Semiconductor and optoelectronic materials |
| Raman Spectroscopy | Phase, strain, stoichiometry, layer count | 2D materials, carbon systems, phase-ambiguous films |
| Optical Spectroscopy | Transmission, reflection, absorption, band edge | Transparent films, coatings, PV and display materials |
| X-Ray Diffraction (XRD) | Phase, crystallinity, strain, texture | Crystalline films, epitaxy, and polycrystalline coatings |
| X-Ray Fluorescence (XRF) | Elemental composition and film thickness | Multilayer or coated samples needing composition data |
| X-Ray Photoelectron Spectroscopy (XPS) | Surface chemistry, oxidation states, depth profiles | Interfaces, contamination, and near-surface chemistry |
| Atomic Force Microscopy | Topography, roughness, step height | Nanoscale surface questions and interface quality |
| Defect Metrology | Defect detection, classification, root-cause correlation | Yield-limiting defects on wafers and patterned samples |
| Optical Modeling | Dispersion models for new material systems | Materials without established literature optical constants |
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